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Modeling Unconventional Nanoscaled Device FABrication
Modeling Unconventional Nanoscaled Device FABrication
Fraunhofer Gesellschaft
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WP1: Project management
WP2: Ion implantation and silicidation
WP3: Epitaxy
WP4: Nanosecond laser annealing of 3D devices
WP5: Device reliability
WP6: Simulation toolchain and benchmarking
WP7: Dissemination, exploitation, and communication
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WP1: Project management
WP2: Ion implantation and silicidation
WP3: Epitaxy
WP4: Nanosecond laser annealing of 3D devices
WP5: Device reliability
WP6: Simulation toolchain and benchmarking
WP7: Dissemination, exploitation, and communication
Publications
Expand / Hide
Public Deliverables
Software
Expand / Hide
MulSKIPS
People for Nanoelectronics
Events
Contact
Expand section
Close section
Protected Sections
Expand / Hide
Partners Section
EC Section
Privileged Partners Section